Photonic Components

Chinese University and Heidelberg Instruments to Cooperate for Advanced R&D Activities Focused on MOEMS

(PRWEB) December 13, 2008 -- Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Zhejiang Normal University, located in Jinhau, China. System will be used in fabrication of Micro Optical Electro Mechanical Devices, as well as photomask production.

The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns.

About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.

###

This press release has been reprinted from PRWEB per the terms and conditions of the copyright notice.

Rate This Article:

Add to Yahoo MyWeb Add to Yahoo Buzz Add to Yahoo Bookmarks Stumble on StumbleUpon Add to Reddit Add to Google Bookmarks Add to Newsvine Add to MySpace Add to Windows Live Add to Furl Add to Fark Add to Facebook Submit to Digg Add to Delicious Add to Blinklist

Comment on "Chinese University and Heidelberg Instruments to Cooperate for Advanced R&D Activities Focused on MOEMS"

Your Name

Your Comments

Verification Code: 78N9E8
Enter Code:

Related News:


Privacy Policy | Copyright/Trademark Notification